Hafnium Dioxide
Catalog NO.: TFMMOM-0026 Category: Metal Oxide
Hafnium dioxide is a white solid at room temperature and pressure. It exists in three crystal structures: monoclinic, tetragonal, and cubic. Its melting point ranges from 2780 to 2920 K, and its boiling point is 5400 K. It is insoluble in water, hydrochloric acid, and nitric acid. It is produced by thermal decomposition or hydrolysis of hafnium sulfate or hafnium oxychloride, and serves as a raw material for producing hafnium metal and hafnium alloys.
| Chemical Formula | HfO2 |
| Storage | This product should be stored in a sealed container in a cool, dry environment. Avoid prolonged exposure to air and moisture to prevent agglomeration, which may negatively impact dispersibility and performance. Additionally, avoid heavy pressure or stacking. |
Semiconductor Material: Used as an alternative gate dielectric in MOSFETs due to its high dielectric constant and low leakage current, overcoming scaling limits of traditional silicon-based devices.
Refractory Material: With a melting point of 2770–2920 ℃ and low thermal expansion, it is used in high-temperature environments such as crucibles and furnace tubes.
Optical Applications: High refractive index and low absorption make it an important material for UV antireflection coatings and interference filters, improving optical component performance.
Catalyst Support: Due to its chemical stability, it is often used as a catalyst or catalyst support in petrochemical catalytic reaction systems.
Special Ceramics: Used to produce high-temperature, high-hardness components such as high-frequency circuit elements and microwave devices.
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