12 Inch Dielectric Etcher
Catalog NO.: AIMRSE-NRDE-052 Category: Nanotechnology R&D Equip
12 Inch Dielectric Etcher is designed for high-aspect-ratio dielectric etching, with typical applications in 3D NAND G5 and beyond for channel hole etching. It is equipped with high-power RF sources, edge plasma adjuster, multi-zone magnetic coils, and advanced temperature and gas control systems for precise vertical etching.
◈ Ultra-high aspect ratio dielectric etching capability.
◈ Precise deep hole topography control.
◈ Fast electrostatic chuck high/low temperature switching technology.
◈ RF-magnetic field sheath adjustment capability.
It is used for 12-inch dielectric etching, especially high aspect ratio dielectric etching.
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