12 Inch General PVD System
Catalog NO.: AIMRSE-NRDE-043 Category: Nanotechnology R&D Equip
12 Inch General PVD System is a system for metal film deposition. Built on a cluster tool architecture with atmospheric and vacuum transfer platforms, degas, pre-clean, and configurable process chambers, it features fully automated operation.
◈ The unique magnetron sputtering source and chamber structure design effectively improves target utilization.
◈ Flexible chamber configuration.
◈ Optimized and stable transport system for advanced packaging applications, compatible with various substrate types including glass wafers, warped wafers, and bonded wafers.
◈ Stable and low Rc performance, with excellent particle and stress control capabilities.
◈ Optimized process flow enables high throughput and low operating costs.
General metal film deposition on 12-inch wafers.
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