12 Inch ICP Etcher
Catalog NO.: AIMRSE-NRDE-057 Category: Nanotechnology R&D Equip
12 Inch ICP Etcher is a plasma dry etcher for silicon etching. It is suitable for logic chip silicon etching, 3D-NAND silicon and step etching, and conductor/metal hard mask etching in DRAM manufacturing at critical technology nodes.
◈ Smaller size & higher aspect ratio etching topology control.
◈ Flexible region-level adjustment of linewidth and critical dimension uniformity control.
◈ Advanced gas-fast switching atomic-layer etching process.
◈ Outstanding small particle size control. Configurable high-throughput, high-efficiency transport platform.
Integrated circuit.
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