12 Inch Metal Etcher
Catalog NO.: AIMRSE-NRDE-055 Category: Nanotechnology R&D Equip
12 Inch Metal Etcher is an inductively coupled high-density plasma dry etcher for 300 mm wafers. It is primarily used for etching metal Al lines or Al pads, as well as for micro-display applications. It is a multi-chamber cluster tool for fully automated serial or parallel processing.
◈ Compatible with various etching materials including aluminum, silicon, oxide, molybdenum, and indium tin oxide.
◈ High-performance electrostatic chuck for stable adsorption of Si wafers and glass sheets.
◈ Diverse methods for adjusting process uniformity.
Integrated circuits and emerging applications.
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