12-Inch PEALD Equipment
Catalog NO.: AIMRSE-NRDE-020 Category: Nanotechnology R&D Equip
12-Inch PEALD Equipment is an atomic layer deposition system that can be configured with up to 3 six-station reaction chambers. Its ALD reactor is mounted on a high-capacity PECVD platform to meet high equipment capacity demands, offering films like PEALD SiO2 and SiN.
◈ High Step Coverage: Achieves step coverage up to 95% at high aspect ratios.
◈ Excellent Film Properties: Delivers excellent film properties with good cost of ownership.
◈ Good Uniformity: Provides good uniformity and shape retention.
◈ Flexible & High-Capacity Configuration: Can be configured with 1 to 3 process modules, each with 6 deposition stations, on a high-capacity platform.
High-volume manufacturing applications requiring PEALD SiO2 and SiN films, leveraging the high-capacity platform for increased throughput.
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