12 Inch PVD System
Catalog NO.: AIMRSE-NRDE-036 Category: Nanotechnology R&D Equip
12 Inch PVD System that includes an atmospheric platform, vacuum transfer platform, degas chamber, pre-clean chamber, and process chambers. It supports various processes, including metal gates, metal silicides, adhesion/barrier layers, and copper seed/barrier layers.
◈ Advanced magnetron sputtering system effectively improves film uniformity and target utilization.
◈ Unique heated base and high-temperature electrostatic chuck design ensure excellent temperature uniformity.
◈ New dual-cavity transfer platform offers high configurability, supporting up to 10 process modules.
◈ High throughput, low operating costs.
Advanced semiconductor manufacturing for metal gate, silicide, barrier, and copper seed layers on 12-inch wafers.
Contact Form
