12-Inch Thermal ALD Equipment
Catalog NO.: AIMRSE-NRDE-021 Category: Nanotechnology R&D Equip
12-Inch Thermal ALD Equipment is a thermal atomic layer deposition system based on core high-throughput PEALD technologies. It is optimized for metal film deposition, featuring a redesigned process module and key components for lower cost and higher purity films.
◈ Optimized Thermal ALD: System design specifically optimized for thermal atomic layer deposition processes.
◈ Process Stability: Precise precursor and chemical dose control ensure long-term process stability.
◈ High Purity Films: Unique temperature control design enables deposition of high-purity films.
◈ Low Cost of Ownership: Easy to maintain with long-life consumable parts and low cleaning costs.
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