8-Inch Low-Damage Etching Machine
Catalog NO.: AIMRSE-NRDE-065 Category: Nanotechnology R&D Equip
8-Inch Low-Damage Etching Machine adopts a unique plasma source with finely controllable etching rate, minimal sidewall and bottom damage, good uniformity, easy maintenance, and stable performance. It excels in etching for Micro LED, GaN power devices, and GaN-GaAs RF devices.
◈ Unique RF system with industry-leading damage and surface control capabilities.
◈ Unique insulating sheet adsorption technology enables stable adsorption of sapphire wafers.
◈ Compatible modes and outstanding process scalability.
◈ Customized software with rapid update capabilities.
GaN power devices, GaAs RF devices, Micro LED.
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