Advanced Dielectric PECVD Equipment
Catalog NO.: AIMRSE-NRDE-017 Category: Nanotechnology R&D Equip
Advanced Dielectric PECVD Equipment are independently designed for dielectric film deposition. Widely used in 28nm and above integrated circuit production, its capability extends to advanced films like high etch selectivity hard masks, low-k, and etch barrier layers.
◈ Broad Process Range: From common layers to advanced films.
◈ Flexible Source Configuration: Can be configured with 1-3 liquid sources.
◈ High Throughput: Excellent process throughput and cost of ownership.
From common layers to advanced films including low-k, ADC I etch barrier, and ultra-low-k Lok II films.
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