Al PVD System
Catalog NO.: AIMRSE-NRDE-042 Category: Nanotechnology R&D Equip
Al PVD System is a physical vapor deposition system designed for aluminum film deposition. Built on a cluster tool architecture with atmospheric and vacuum transfer platforms, degas, pre-clean, and configurable process chambers, it features fully automated operation.
◈ Advanced magnetron sputtering system effectively improves film uniformity and target utilization.
◈ Unique heated base and high-temperature electrostatic chuck design ensure excellent temperature uniformity.
◈ New dual-cavity transfer platform offers high configurability, supporting up to 10 process modules.
◈ High throughput, low operating costs.
Deposition of films in semiconductor manufacturing.
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