Chemical Vapor Etcher
Catalog NO.: AIMRSE-NRDE-051 Category: Nanotechnology R&D Equip
Chemical Vapor Etcher is primarily used for selective etching of silicon oxide in advanced process nodes. It features high etching uniformity, high selectivity, low damage, and high process control precision, consisting of a large platform transfer system, main process chamber, annealing chamber, and process control system.
◈ High Uniformity & Selectivity: Offers high etching uniformity and high selectivity.
◈ Low Damage: Low-damage etching process.
◈ High Precision: High process control precision.
◈ Stable & Efficient: System is stable, efficient, and offers high throughput.
Selective oxide etching for logic and memory.
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