Compound Semiconductor Etcher
Catalog NO.: AIMRSE-NRDE-067 Category: Nanotechnology R&D Equip
Compound Semiconductor Etcher adopts an ultra-high-density plasma source with a high etching rate, good uniformity, stable performance, long MTBC, and easy maintenance. It is widely used in SiC-Power, GaAs-RF, GaN-RF, filters, optics, and other fields.
◈ Unique plasma source and frequency design suitable for etching strongly bonded materials.
◈ Excellent etching rate and uniformity, long PM cycle time.
◈ Flexible system configuration suitable for various applications in R&D, pilot lines, and large-scale production lines.
◈ Adaptable to multiple endpoint detection methods.
Power devices, compound semiconductors, novel applications, scientific research.
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