Dual E-Gun Co-Evaporation Coating System
Catalog NO.: AIMRSE-NRDE-010 Category: Nanotechnology R&D Equip
Dual E-Gun Co-Evaporation Coating System features dual electron guns for co-evaporation of alloy films. It operates in high or ultra-high vacuum, offers precise rate and thickness control, broad substrate temperature range, and is suitable for R&D, pilot, and mass production.
◈ Dual Electron Guns: Enable co-evaporation for alloy film deposition.
◈ High/Ultra-High Vacuum: Configurable for high or ultra-high vacuum environments.
◈ Broad Temperature Control: Substrates can be heated to high temperatures or cooled to low temperatures.
◈ High Precision: High-precision control of deposition rate and film thickness ensures excellent uniformity and repeatability.
◈ Optional Modules: Load lock for automatic sample loading, ion beam cleaning/assisted deposition, and RF plasma cleaning.
◈ Automation: PLC + PC fully automatic control.
◈ Versatile Sample Stages: Multiple or custom sample stages for special process films.
Suitable for single-layer, multi-layer films, co-evaporation of alloy films, LIFT-OFF processes, and low-dimensional material preparation.
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