Electron Beam Evaporation Coating System
Catalog NO.: AIMRSE-NRDE-006 Category: Nanotechnology R&D Equip
Electron Beam Evaporation Coating System is a high-vacuum evaporation system designed for depositing high-quality thin films of metals, semiconductors, and dielectric materials. It features precise rate and thickness control, broad substrate temperature range, and is suitable for single-layer, multi-layer, and LIFT-OFF processes.
◈ High-Vacuum Environment: Ensures high-quality film deposition.
◈ Broad Temperature Control: Substrates can be heated to high temperatures or cooled to low temperatures.
◈ High Precision: High-precision control of deposition rate and film thickness ensures excellent uniformity and repeatability.
◈ Automation: PLC + PC fully automatic control.
◈ Optional Modules: Load lock for automatic sample loading, ion beam cleaning/assisted deposition, and RF plasma cleaning.
◈ Versatile Sample Stages: Multiple or custom sample stages for special process films.
Capable of depositing metal, semiconductor, and dielectric materials
Suitable for depositing single-layer or multilayer thin films
Applicable for R&D, pilot-scale production, or mass manufacturing
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