Electron Beam Evaporator
Catalog NO.: AIMRSE-NRDE-009 Category: Nanotechnology R&D Equip
Electron Beam Evaporator is designed for pilot and mass production with batch sample evaporation capability. It features a high-vacuum environment, precise rate and thickness control, and substrate heating, suitable for depositing single-layer, multi-layer films, and LIFT-OFF processes.
◈ Production-Oriented Design: Designed for pilot and mass production with batch sample evaporation capability.
◈ High-Vacuum Environment: Ensures high-quality film deposition.
◈ Substrate Heating: Samples can be heated.
◈ High Precision: High-precision control of deposition rate and film thickness ensures excellent uniformity and repeatability.
◈ Optional Module: Ion beam cleaning/assisted deposition.
◈ Automation: PLC + PC fully automatic control.
Process Capabilities: Suitable for single-layer, multi-layer films, LIFT-OFF processes, and low-dimensional material preparation.
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