HDPCVD Equipment
Catalog NO.: AIMRSE-NRDE-023 Category: Nanotechnology R&D Equip
HDPCVD Equipment is a 12-inch high-density plasma chemical vapor deposition system. It is used as a channel dielectric fill in applications such as STI, PMD, ILD, and IMD, and is widely employed in logic and memory chip manufacturing processes. It features a hexagonal high-capacity platform.
◈ High-Quality Films: Deposits high-quality SiO2 and FSG films.
◈ Excellent Particle Performance: Achieves low particle levels.
◈ Controllable Process: Deposition and etch rates are controllable and adjustable.
Dielectric gap fill in logic and memory chip manufacturing, including STI, PMD, ILD, and IMD layers.
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