High-Density Plasma Chemical Vapor Deposition (HDPCVD) System
Catalog NO.: AIMRSE-NRDE-025 Category: Nanotechnology R&D Equip
High-Density Plasma Chemical Vapor Deposition (HDPCVD) System suitable for integrated circuits and power semiconductors. It enables fully automated processing of 12-inch wafers.
◈ Standardized Transfer System: Ensures reliable wafer handling.
◈ Modular Chamber Design: Offers flexible configuration and high functional integration.
◈ Wide Process Window: Accommodates diverse process requirements.
◈ Advanced Technology: All key process indicators reach internationally advanced levels.
Integrated circuits, power semiconductors.
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