High Selectivity Etcher
Catalog NO.: AIMRSE-NRDE-046 Category: Nanotechnology R&D Equip
High Selectivity Etcher features a high-density, low-damage plasma source and an ultra-high efficiency ion filter. It is designed for surface treatment in advanced memory processes with high aspect ratios, as well as high-selectivity, high-precision metal hard mask etching.
◈ Advanced plasma control technology ensures excellent uniformity.
◈ Independent control of plasma density and energy.
◈ Ultra-high ion filtration efficiency allows for precise regulation of reaction energy.
◈ Higher etching selectivity allows for a wider range of etching materials.
Advanced memory manufacturing (3D structures), and high-precision metal hard mask etching.
Contact Form
