High-Throughput Dielectric PECVD Equipment
Catalog NO.: AIMRSE-NRDE-018 Category: Nanotechnology R&D Equip
High-Throughput Dielectric PECVD Equipment is independently developed for high throughput, especially for long-deposition-time processes. It achieves technological breakthroughs in film uniformity, roughness, stress control, particle control, and productivity.
◈ High Productivity Design: Designed for high throughput with fast switching between multiple film types.
◈ Long Process Capability: Realizes high throughput for processes requiring long deposition times.
◈ High-Temperature Deposition: Meets requirements for high-temperature deposition in the 300-600°C range.
◈ Multi-Wafer Chamber: Process chamber can be used for multiple wafer deposition.
High-volume manufacturing of dielectric films, particularly required for processes requiring long deposition times.
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