Multi-E-Gun Evaporation Coating System
Catalog NO.: AIMRSE-NRDE-011 Category: Nanotechnology R&D Equip
Multi-E-Gun Evaporation Coating System features multiple electron guns (configurable with three, four, or six) for advanced co-evaporation of alloy films. It operates in high or ultra-high vacuum, offers precise rate and thickness control, broad substrate temperature range, and is suitable for R&D, pilot, and mass production.
◈ Multiple Electron Guns: Configurable with three, four, or six guns for complex co-evaporation and alloy film deposition.
◈ High/Ultra-High Vacuum: Configurable for high or ultra-high vacuum environments.
◈ Broad Temperature Control: Substrates can be heated to high temperatures or cooled to low temperatures.
◈ High Precision: High-precision control of deposition rate and film thickness ensures excellent uniformity and repeatability.
◈ Optional Modules: Load lock for automatic sample loading, ion beam cleaning/assisted deposition, and RF plasma cleaning.
◈ Automation: PLC + PC fully automatic control.
Capable of depositing metals, semiconductors, and dielectric materials.
Can be used for depositing single-layer and multi-layer films.
Can co-evaporate alloy films.
LIFT-OFF process deposition.
Low-dimensional material preparation.
Used for research and development, pilot production, and mass production.
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