Multi-Functional Etcher
Catalog NO.: AIMRSE-NRDE-066 Category: Nanotechnology R&D Equip
Multi-Function Etcher adopts a high-density plasma source with high etching rate, good uniformity, excellent particle control, easy maintenance, and stable performance. It has high process compatibility and can etch various materials such as dielectrics, metals, and compounds, making it widely used in scientific research, universities, and emerging fields.
◈ Unique plasma source design ensures excellent etching uniformity.
◈ Flexible system configuration suitable for various applications from R&D, pilot lines, to large-scale production lines.
◈ A comprehensive process database is available to support R&D needs.
Compound semiconductors, scientific research, emerging applications.
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