Patterned Substrate Etcher
Catalog NO.: AIMRSE-NRDE-069 Category: Nanotechnology R&D Equip
Patterned Substrate Etcher is a plasma dry etcher applied to LED sapphire substrate etching processes. It features dual reaction chambers, a tray-type, multi-wafer tray-in tray-out fully automatic operation. The equipment is suitable for etching various substrates for Mini LED and Micro LED, covering PSS, NPSS, and CPSS etching processes.
◈ Unique plasma source design for high selectivity.
◈ Multi-pallet tray operation for high throughput.
◈ Fast etching rate and straight sidewall angles.
◈ Temperature gradient design for excellent particle control.
◈ Equipped with an automated transfer system for automation and intelligence.
LED substrate manufacturing.
Contact Form
