Plasma Dielectric Etcher
Catalog NO.: AIMRSE-NRDE-048 Category: Nanotechnology R&D Equip
Plasma Dielectric Etcher is a capacitively coupled plasma (CCP) dry etcher for 6/8-inch dielectric layer etching. It is a multi-chamber cluster tool capable of fully automated parallel processing, covering a wide range of processes with optimized front-end and back-end performance.
◈ Enables 6/8-inch switching.
◈ Multi-frequency decoupling design, covering both front-end and back-end processes.
◈ Unique RF frequency design, high etching rate, and high selectivity.
◈ Excellent mass production stability in both front-end and back-end processes, with longer maintenance intervals.
Dielectric layer etching in IC, power device, and compound semiconductor manufacturing.
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