PVD ITO Sputter System
Catalog NO.: AIMRSE-NRDE-039 Category: Nanotechnology R&D Equip
PVD ITO Sputter System is a PVD system primarily designed for ITO (Indium Tin Oxide) deposition processes on 4/6/8-inch wafers. The system consists of a transfer module, process module, auxiliary equipment, and power cabinet.
◈ ITO Deposition Focus: Specifically designed for ITO film deposition.
◈ Compact Footprint: Small footprint for efficient space utilization.
◈ Simple & Flexible: Simple structure with flexible operation.
◈ Low Cost of Ownership: Easy maintenance and low operating costs.
ITO deposition for applications such as flat panel displays, touch panels, and optoelectronic devices on 4/6/8-inch substrates.
Contact Form
