PVD System
Catalog NO.: AIMRSE-NRDE-037 Category: Nanotechnology R&D Equip
PVD System is a general-purpose PVD system for metal film deposition. Built on a cluster tool architecture with vacuum transfer, degas, pre-clean, and multiple process chambers, it is suitable for large-scale production in the packaging field.
◈ The unique magnetron sputtering source and chamber structure design effectively improves target utilization.
◈ Flexible chamber configuration.
◈ Optimized and stable transport system for advanced packaging applications, compatible with various substrate types including glass wafers, warped wafers, and bonded wafers.
◈ Excellent particle and stress control capabilities.
◈ Optimized process flow delivers high throughput and low operating costs.
Large-scale thin film production for semiconductor packaging applications.
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