Superconducting Quantum Material Thin Film Processing System
Catalog NO.: AIMRSE-NRDE-002 Category: Nanotechnology R&D Equip
Superconducting Quantum Material Thin Film Processing System is an ultra-high vacuum sputtering system optimized for depositing high-quality thin films of superconducting and quantum materials. It features up to 6 sputtering sources with adjustable distance, versatile power options, and includes a load lock for automatic sample transfer.
◈ Ultra-High Vacuum Environment: Optimized for sensitive material deposition.
◈ Multiple Sputtering Sources: Up to 6 sources with adjustable target-to-substrate distance.
◈ Versatile Power Options: Supports DC, pulsed DC, RF, and HiPIMS power supplies.
◈ Broad Temperature Control: Substrates can be heated to high temperatures or cooled to low temperatures.
◈ High Precision: High-precision control of deposition rate and film thickness ensures excellent uniformity and repeatability.
◈ Excellent Adhesion: Produces films with strong adhesion.
◈ Load Lock Standard: Includes load lock for fully automatic sample delivery.
◈ Optional Modules: Ion beam cleaning/assisted deposition and RF plasma cleaning.
◈ Automation: PLC + PC fully automatic control.
Depositable materials include metals, semiconductors, and dielectric materials.
Suitable for multilayer thin film sputtering and co-sputtering alloy thin films.
Applicable for research and development (R&D), pilot production, or mass production.
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