Ultra-Low Dielectric Constant Thin Film UV Treatment System
Catalog NO.: AIMRSE-NRDE-027 Category: Nanotechnology R&D Equip
Ultra-Low Dielectric Constant Thin Film UV Treatment System is a CVD system designed for post-deposition UV curing of ultra-low-k dielectric films for back-end-of-line processes. It is applicable in integrated circuits and power semiconductors, processing 12-inch wafers automatically.
◈ Dual-chamber design for high throughput and low operating costs.
◈ Unique airflow design and pressure control components ensure a stable process environment.
◈ Excellent UV irradiation control provides superior temperature performance.
◈ In-situ chamber cleaning technology enhances process stability and consistency.
Integrated circuits, power semiconductor.
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