Vacuum Coating Complete Solutions
High‑quality thin films — whether for optical coatings, hard wear layers, or decorative finishes — demand precise vacuum control, repeatable deposition rates, and clean chamber conditions. AIMRSE designs and builds complete vacuum coating systems tailored to your process: physical vapor deposition (PVD), chemical vapor deposition (CVD), magnetron sputtering, thermal evaporation, or e‑beam evaporation. Our turnkey solutions integrate chamber (custom sizes, ports, and fixtures), pumping stack (turbo or diffusion pumps with dry/oil‑sealed backing), gas delivery (MFCs for Ar, O₂, N₂), and automation (PLC/HMI with recipe management). Base pressures range from 10⁻⁶ to 10⁻⁷ mbar, with pump‑down times under 20 minutes. We provide full process validation, operator training, and documentation. Ideal for optical coating, semiconductor barrier layers, tool coating, and R&D thin‑film development. Supported by US‑based service and remote diagnostics.
Consult Our Coating System Engineers
Discuss your substrate size, deposition material, film uniformity requirements, and throughput targets.
Vacuum Coating System Engineering Priorities
Controlled Deposition Environment
Base pressure 10⁻⁶–10⁻⁷ mbar, low residual gas impurities. Turbo or diffusion pumping with cryo-traps for water vapor reduction.
Precise Process Control
Mass flow controllers for gas mixture, programmable power supplies (DC, RF, pulsed DC), and automated substrate rotation for uniformity.
Recipe Management & Data Logging
Store up to 100 recipes with ramp/soak profiles. Log pressure, gas flow, power, and rate for each run. Full audit trail for quality assurance.
Vacuum Coating System Engineering Workflow
From process specification to commissioned system — fully documented and validated.
Define substrate size, deposition material, required uniformity, and cycle time.
3D CAD of chamber, port locations, substrate holder (planetary/rotary), and source placement.
Select turbo/diffusion/cryo pump, backing pump, MFCs for process gases, and pressure control.
Install DC/RF/pulsed DC power supplies, PLC/HMI, and recipe management software.
Pump‑down test, deposition test with witness samples, uniformity measurement.
SAT, operator training, process optimization, and handover of documentation.
The Advantages of AIMRSE
Custom engineered, process‑optimized, and fully supported.
Custom Chamber & Fixture Design
Any size, shape, or port configuration. Planetary, rotating, or stationary substrate holders for uniform coating.
Multiple Deposition Technologies
Magnetron sputtering (DC, RF, pulsed DC), cathodic arc, thermal/electron‑beam evaporation, and CVD.
Automated Process Control
PLC with touch HMI, recipe storage (up to 100 recipes), data logging, and remote monitoring via OPC UA or Modbus TCP.
Process Development Support
Our engineers help optimize deposition parameters for your specific material and film properties. On‑site commissioning and training included.
Vacuum Coating System Success Stories
Real improvements in film quality, throughput, and repeatability.
Optical Coating Production Line
Arizona, USAAn optical coating manufacturer needed a high‑throughput system for anti‑reflective coatings on glass. AIMRSE delivered a 1 m diameter cylindrical chamber with dual magnetron sputtering cathodes (Ti and SiO₂ targets), reactive gas control (Ar/O₂), and planetary substrate rotation. The system achieves ±2% uniformity over 500 mm diameter substrates and processes 50 lenses per batch. Recipe management allows rapid changeover between coating stacks.
Hard Coating for Cutting Tools
Virginia, USAA tool manufacturer required a cathodic arc evaporation system for TiN and TiAlN coatings on carbide inserts. AIMRSE supplied a chamber with three arc sources, rotary fixturing for 200 inserts per batch, and a diffusion pumping stack. The system deposits 0.2 µm coatings with hardness >30 GPa. Cycle time is 90 minutes, including pump‑down, etching, deposition, and cooling.
R&D Multi‑target Sputtering System
Oregon, USAA materials research lab needed a flexible sputtering system for depositing metallic and oxide thin films on up to 4" wafers. AIMRSE built a compact chamber with four 2" magnetron sputtering guns (two DC, two RF), a turbo‑molecular pump (base pressure 2×10⁻⁷ mbar), and a touchscreen controller with recipe storage. The system supports co‑sputtering and reactive sputtering with MFCs for Ar, O₂, and N₂.
Customer Reviews
Real feedback from coating engineers and lab managers.
Technical FAQ
What is the typical base pressure and pump‑down time for a coating system?
What deposition technologies do you offer for coating systems?
Can you integrate substrate heating and bias voltage?
Do you provide validation and documentation for regulated industries (aerospace, medical)?
Featured Solutions
Note: Our vacuum equipment is for research and industrial testing only. Industrial-grade components are fully rated for field deployment.
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