FA Failure Analysis Probe Station

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Catalog NO.: AIMRSE-PS-S-15

FA Failure Analysis Probe Station

Structure mainly consists of a probe station system and a laser system. Performs failure analysis on chips and RF devices, IV/CV characterization of materials/devices, internal circuit/pad probing, and IC/panel internal circuit modification/layer removal at ambient or high-low temperatures.

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Product Highlights Failure analysis & laser test
Chuck Size 4~12 inches (configurable)
Temperature Range Ambient or high-low (optional)
Microscope / Optics Uses 50X/100X objectives for laser processing
Positioning Precision Min processing: 1μm (100X); Max processing: 40μm (50X)
Features Integrated with laser system for failure analysis/circuit modification; ESI laser: 1064/532/355nm, 2.2mJ/pulse, 1-50Hz; quantel laser: 1064/532/355nm, 20/6/8mJ/pulse, 100Hz; Processes: Cu, Au, Poly Si, Al, SiO₂, Cr, ITO, Ni, TFT, RGB, Mo, Nitride, Polymide

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